Patent Pending X-Y Planar Motion System:
ALIO has developed the next generation of nano-precision X-Y Planar system for Semiconductor, FPD and other application needing less than 1 arc second of pitch, yaw and roll with picometer resolution over large volumes. The ALIO team took a new approach to the next generation of equipment needed for the FPD and metrology markets. Larger glass for Gen 7, 8 and beyond in FPB the issues of maintaining high volume and high yields during process and inspection the need for a new mechanical design to eliminate mechanical beam thermals, bending and orthogonality position errors. The ALIO X-Y Planar system decouples and isolates the X and Y beam thermals, sage and alignment issues in a novel but simple kinematic design.
The X-Y Planar system has an application dependant platen for open center or vacuum wafer chuck mounting.
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